Description
The OmniVac EBV 100 Electron Beam Evaporator is designed for high precision thin film growth and molecular beam epitaxy. The precisely defined vapor beam allows for a highly uniform deposition on the substrate. The deposition area is determined by the distance between source and sample and the choice of an easily exchangeable exit mask. The PS-EEV 100 power supply is designed to provide highly stable operation conditions, i.e. beam energy and filament current. A ion flux controller allows for an automated deposition using PID regulation.
EBV 100 Electron Beam Evaporator
| Temperature range | 400 – 2600 K, up to 3600 K using Mo connectors |
| Electron energy | 0 – 1500 eV |
| Max. emission current | 200 mA |
| Max. power output | 300 W |
| Filament current | 1.8 – 2.2 A, max. 2.5 A |
| Working distance | 70 – 75 mm |
| Spot diameter of evaporated material | 0.5 – 2.3 mm |
| Cooling system | Water flow > 0.5 l/min, max. 6 bar |
| Insertion depth | min. 190 mm |
| Mounting flange | DN 40 CF (OD 35 mm) |
PS-EBV 100 Power Supply
| Beam energy | Error < 1 eV, ripple < 0.5 Vpp |
| Filament current | Error 0.1 A, ripple < 0.05 Vpp |
| Ion flux monitor | 10 nA – 100 mA, 8 ranges, 1% accuracy per range |
| Flux regulation control | PID controller |
| Dimensions (W x H x D) | 19’’ x 133 mm x 350 mm |
| Modes | auto (flux controlled), manual (no flux control) |
